Katharine Blur Blodgett was born January 10, 1898. Her father was a patent attorney working for GE in Schenectady, NY. She started working with GE as an assistant to Langmuir, one of the most famous plasma physicists from whom the name plasma derives. I have several things in common with Blodgett. The first being a …
Continue reading Top Plasma Scientists I admire – Katharine Blodgett #Science
There are 15,000 traceable objects orbiting earth representing 6000 tons of material. There is now a real need for debris removal. The broom in the sky. This space craft sweeps debris using a plasma generated ion beam. The paper shows detailed modelling of the process showing problems like back-scattering of ions and charging of the …
Continue reading Broom in the sky. Plasma propulsion to remove debris from orbit. #tech
Plasma is the ‘hidden champion’ of industrial innovation – Prof. Christian Oehr In a recent inteview with Professor Christian Oehr, head of the interfacial engineering and materials science department at Fraunhofer IGB in Stuttgart, Germany, refers to plasma as the hidden champion. When asked what a plasma is, Prof. Oehr explained that Plasma is created …
Modeled plasma density about a magnetized asteroid
Figure 5: FIBSEM micrographs of Mo(1.5%):ZnO films deposited at a sputtering pressure of 1 × 10−2 mbar and at a substrate temperature of 473 K. I looked at publications in the Indian Journal. Material Science. Generally, papers on plasma processes were quite rare. This is one of the few interesting one using RF plasma sputtering. The application was …
Learning from analysis of the internet scientist in the area of plasma physics have realised the importance of network graphing. These graphs outline the linear processes that can occur like the subway map of a line. However when many competing paths exist the maps the maps can begin to look like the London underground. In …
Discharge sources in tin vapor are receiving attention as a candidate for extreme ultraviolet light sources for application in semiconductor lithography, because of their favorable spectrum near 13.5 nm, which is 30 times smaller than the wavelength of visible light. In an 2005 paper, the ASML EUV laboratory studied time-resolved pinhole imaging in the EUV …
