Tin vapor is the next big thing in light sources and an evolving new plasma application. These source produce light at the extreme end of the UV spectrum to make patterns at a few nano meters. #plasma #semiconductor

Discharge sources in tin vapor are receiving attention as a candidate for extreme ultraviolet light sources for application in semiconductor lithography, because of their favorable spectrum near 13.5 nm, which is 30 times smaller than the wavelength of visible light.  In an 2005 paper, the ASML EUV laboratory studied time-resolved pinhole imaging in the EUV …

Continue reading Tin vapor is the next big thing in light sources and an evolving new plasma application. These source produce light at the extreme end of the UV spectrum to make patterns at a few nano meters. #plasma #semiconductor

Basic Plasma Physics: Course 2, History of Plasma Physics

I am publishing the second in a series of courses in Plasma Physics, A brief History of Plasma Physics. It is interesting that the term plasma was first used by Langmuir in 1920's, less than a hundred years ago.  The contribution made by plasma to our everyday life is now quite remarkable.  Everything from mobile …

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“What is a Plasma in Physics” – II

I am making available with the kind premission of the author a Plasma Course developed by Richard Fitzpatrick at UT Dallas.  This is the best course I have seen on the web on basic plasma physics. I intend to publish the course over the next number of weeks, starting with - What are plasmas in Physics II.  I have titled …

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