The early registration deadline for the Pulsed Plasma Diagnostic Workshop is fast approaching (29th May 2012). Please register as soon as possible as places are limited.
Please find the 2nd announcement for the PPDW attached. Pulsed plasma discharges are used for a variety of applications in modern industry. Magnetron sputtering and HiPIMS discharges, used for depositing layers, generally use pulsed direct current (pDC) excitation of the target and/or substrate to generate the plasma and control the layer properties. Operating frequencies range from 100’s Hz to 100’s kHz, typically.
Recently, there has been a move towards pulsed radio-frequency (pRF) discharge operation by the etching community where the rf driving frequency is pulsed in the 10’s kHz range. In these devices (inductively coupled (ICP) reactors, for example) the source and/or bias frequency are pulsed independently or synchronously to provide better control over the ion energy and etch properties. There are many other examples and uses of pulsed plasmas in the wider community also.
The purpose of this workshop is to gather a team of leading experts from the various pulsed plasma fields to share their knowledge and expertise in the art of pulsed plasma diagnostics. This will provide a unique opportunity for plasma physicists from different fields to interact and learn about diagnostic techniques that may now be applicable to their own research. A stimulating workshop, along with some exciting social activities, will make this an event to remember. Please visit the link below for more information.