Ion energy distribution measurements in rf and pulsed DC plasma discharges
D Gahan, S Daniels, C Hayden, P Scullin, D O’Sullivan, Y T Peiand M B Hopkins.
This paper is one in which I am an author and it looks at ion energy distributions at the surface in two plasma reactors an RF plasma etcher and a pulsed DC magnetron. The two nice things are:
1) how a simple model of the plasma sheath will allow the results of the retarding field analyser to give you a lot of detail on the plasma. Measurements of plasma density and plasma potential are possible as well as the usual ion energy distribution function
2) How the RFEA can make time resolved measurements with time resolution in the 100ns range.